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Appl Environ Microbiol. 1984 September; 48(3): 556-560
Copyright © 1984, American Society for Microbiology. All Rights Reserved.

Effects of Aluminum and Manganese on the Growth of Ectomycorrhizal Fungi

Gail W. Thompson and Richard J. Medve*

Department of Biology, Slippery Rock University, Slippery Rock, Pennsylvania 16057

ABSTRACT

Cenococcum graniforme, Suillus luteus, Thelephora terrestris, and three isolates of Pisolithus tinctorius were cultured on modified Melin-Norkrans medium at pH 3.4 and adjusted to 0 to 500 ppm (0 to 500 µg/ml) of aluminum or manganese sulfate. Except for T. terrestris, which was intolerant of aluminum at 150 and 250 to 500 ppm, and P. tinctorius isolate 250, which was intolerant of aluminum at 450 ppm, all fungi showed some growth at all concentrations of aluminum. S. luteus was the most tolerant to aluminum. Manganese was less fungitoxic than aluminum, with all fungi showing at least 65% growth at 500 ppm as compared with the control. C. graniforme was not inhibited at any concentration of manganese, and S. luteus was only affected at 500 ppm. P. tinctorius isolate 230 showed no significant variation in growth when subjected to various concentrations of three forms of manganese salts. Significant differences in growth were detected in response to three aluminum salts, but no detectable pattern was apparent. Genotypic responses to aluminum and manganese were evident for P. tinctorius. Isolates 210 and 230 were more tolerant to manganese than was isolate 250. Aluminum tolerance was in the order of isolate 230 > 210 > 250. Results of in vitro studies concerning tolerance responses of ectomycorrhizal fungi to aluminum and manganese were not consistent with field observations of the successional sequence of these fungi on acid coal spoils.


FOOTNOTES

* Corresponding author.


Appl Environ Microbiol. 1984 September; 48(3): 556-560
Copyright © 1984, American Society for Microbiology. All Rights Reserved.







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Copyright © 1984 by the American Society for Microbiology. All rights reserved.