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Appl Environ Microbiol. 1991 May; 57(5): 1560-1562
Copyright © 1991, American Society for Microbiology. All Rights Reserved.

Pseudomonas putida Which Can Grow in the Presence of Toluene

Akira Inoue^,*, Mami Yamamoto and Koki Horikoshi^,

The Riken Institute, 2-1 Hirosawa, Wako shi, Saitama 351-01, Japan

ABSTRACT

A Pseudomonas putida strain able to grow in the presence of more than 50% toluene was isolated from soil. The strain was tolerant of other toxic solvents, including aliphatic hydrocarbons, alicyclic hydrocarbons, aromatic hydrocarbons, alcohols, and ethers. The stability of the solvent tolerance of strain IH-2000 was stimulated by addition of Mg²⁺ and Ca²⁺ to the medium containing toluene.

^* Corresponding author.

Present address: Laboratory of Microbial Ecology, The Riken Institute, 2-1 Hirosawa, Wako-shi, Saitama 351-01, Japan.

Present address: Department of Bio-Engineering, Tokyo Institute of Technology, O-okayama, Meguro-ku, Tokyo 152, Japan.

This article has been cited by other articles:

• Kim, K., Lee, S., Lee, K., Lim, D. (1998). Isolation and Characterization of Toluene-Sensitive Mutants from the Toluene-Resistant Bacterium Pseudomonas putida GM73. J. Bacteriol. 180: 3692-3696 [Abstract] [Full Text]